%0 Journal Article
%@holdercode {isadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S}
%@nexthigherunit 8JMKD3MGPCW/3ESR3H2
%@secondarymark B2_ASTRONOMIA_/_FÍSICA A1_ENGENHARIAS_II A2_ENGENHARIAS_III A1_ENGENHARIAS_IV A1_MATERIAIS B1_QUÍMICA
%3 azevedo.pdf
%@mirrorrepository sid.inpe.br/mtc-m19@80/2009/08.21.17.02.53
%D 2010
%4 sid.inpe.br/mtc-m19@80/2010/07.19.14.07
%T The effect of surface treatment on oxidation of oxalic acid at nanocrystalline diamond films
%@usergroup administrator
%@usergroup marciana
%V 19
%@affiliation Instituto Nacional de Pesquisas Espaciais (INPE)
%@affiliation Instituto Nacional de Pesquisas Espaciais (INPE)
%@affiliation Instituto Nacional de Pesquisas Espaciais (INPE)
%@affiliation Instituto Nacional de Pesquisas Espaciais (INPE)
%@affiliation Instituto Nacional de Pesquisas Espaciais (INPE)
%@affiliation Instituto Nacional de Pesquisas Espaciais (INPE)
%@versiontype publisher
%X The surface investigation of undoped and boron doped nanocrystalline diamond (NCD/BDND) films associated to their electrochemical behavior of oxalic acid after four pre-treatments was studied. The films were produced using Not Filament CVD technique on Si substrate with a gas mixture of CH4/H-2/Ar. Surface pre-treatments were carried out to analyze the surface chemical changes induced by hydrogen and oxygen plasma and as well as cathodic and anodic treatments performed in 0.1 mol L-1 HClO4. The films wetting analyzed by contact angle presented a strong dependence of their surface before and after each treatment was also confirmed by the electrochemical response from cyclic voltammograms. Independent of the surface pre-treatments, all the electrodes exhibited response for oxalic acid oxidation, but the electrode submitted to hydrogen plasma presented the lowest starting oxidation potential and the highest current density. Nonetheless, the BDND electrode presented higher oxidation current than that for NCD electrodes, after all pre-treatments studied. The use of square wave voltammetry with BDND electrode treated by hydrogen plasma for the analytical determination of oxalic acid is described. The detection limits of 0.75 mu nol was obtained from the linear relationship between the peak currents of voltammograms as a function of the oxalic acid concentrations.
%8 May-Junho
%@area FISMAT
%@secondarykey INPE--PRE/
%@documentstage not transferred
%K doped diamond, electrochemical oxidation, electrodes, wettability, cvd.
%@archivingpolicy denypublisher denyfinaldraft24
%@doi 10.1016/j.diamond.2010.01.006
%@issn 0925-9635
%@group LAS-CTE-INPE-MCT-BR
%@group LAS-CTE-INPE-MCT-BR
%@group LAS-CTE-INPE-MCT-BR
%@group LAS-CTE-INPE-MCT-BR
%@group LAS-CTE-INPE-MCT-BR
%@group LAS-CTE-INPE-MCT-BR
%N 5-6 Sp. Iss. SI
%@dissemination WEBSCI; PORTALCAPES; COMPENDEX.
%O Proceedings Paper
%P 462 - 465
%A Azevedo, A. F.,
%A Braga, N. A.,
%A Souza, F. A.,
%A Matsushima, J. T.,
%A Baldan, M. R.,
%A Ferreira, N. G.,
%B Diamond and Related Materials
%2 sid.inpe.br/mtc-m19@80/2010/07.19.14.07.45
%@secondarytype PRE PI